TiO2, SiO2, WO3, Pt, Ag (UA), SnO2 (ITO), CNT, hardness enhancers, transparency … and other specialized substances. “The elements needed to make NANO against dust are known by many manufacturers but the technology to produce and the ability to control the combination of those elements is outside the current Sketch company. In the world, no company has yet made or created by mixing a few essential elements.
Example: In order to create an ITO / SnO2 film that is similar to Sketch’s film coating on a solar cell, the current technology is DC magnetron sputtering. This ITO / SnO2 film must be incubated at high temperature of 450oC for 1 – 4.5 hours. Because it is not possible to incubate the panels at that temperature, other NANO manufacturers often cut or use SiO2 substrates only. ”